Fraunhofer Institute for Photonic MicrosystemsDresden / November 03, 2026 - November 04, 2026
Silicon and Silicon-Germanium Epitaxy Users Meeting
An der Bartlake 5, 01109 Dresden, Germany
(Room: "Großer Zschirnstein")
Si and SiGe Epitaxy Users Meeting
November 3-4, 2026 (Dresden, Germany)
Silicon and Silicon-Germanium Epitaxy Users Meeting
Epitaxy - One of the most demanding processes in semiconductor manufacturing
Silicon and Silicon-Germanium Epitaxy Users Meeting (November 3-4, 2026)
The Silicon and Silicon-Germanium Epitaxy Users Meeting brings together professionals from across the semiconductor value chain—including industry experts, researchers, equipment manufacturers, and technology providers—to strengthen the Si, SiGe, and Ge epitaxy community.
The meeting serves as a dedicated platform for technical exchange, knowledge sharing, and collaboration. Participants will discuss the latest developments, emerging challenges, and innovative solutions across the entire epitaxy ecosystem, fostering new partnerships and advancing the state of the art in semiconductor manufacturing.
Key technical topics include:
- Epitaxial growth of Si, SiGe, and Ge
- Equipment technology and reactor design
- Process and device simulation
- Smart data analytics and digitalization
- Materials and substrate engineering
- Abatement, sustainable gas management, and safety
- In-situ and ex-situ metrology
Whether you are developing epitaxy equipment, optimizing manufacturing processes, advancing metrology solutions, or conducting research in epitaxial materials, this meeting provides an excellent opportunity to exchange ideas, discover innovations, and help shape the future of semiconductor epitaxy.
Participants of the Silicon and Silicon-Germanium Epitaxy Users Meeting 2025.
Agenda
(preliminary)
- 03 November 2026: Technical Session (13:00 - 18:00)
- 03 November 2026: Networking Dinner (at own expense)
- 04 November 2026: Technical Sessions (09:00–13:00)
Registration & Contribution
Registration:
- Please register using the form below. Deadline: October 2, 2026
Your oral Contribution:
Registration
Silicon and Silicon-Germanium Epitaxy Users Meeting (November 3-4, 2026) - Registration deadline: October 2, 2026