Fraunhofer Institute for Photonic Microsystems
200 mm cleanroom layout at Fraunhofer IPMS:
We offer a state-of-the-art, fully integrated and CMOS-compatible ME(O)MS-on-CMOS line.
Our cleanroom, with its qualified team and industry-oriented facilities, is ideally positioned for research and development in the field of MEMS and MOEMS devices. In addition to a deep understanding of state-of-the-art MEMS manufacturing processes, coupled with modern fab technology, we are the perfect partner for technology and device development.
Our 200 mm Cleanroom at a Glance
- Cleanroom class: Class 10 (ISO 4) across 1,500 m²
- Production: Low-volume, high-mix production
- Operation: 24/5, three-shift operation
- Personnel: 45 engineers plus 45 operators and maintenance technicians
- Capacity: Approximately 1,000 wafer starts per month
- Compatibility: Fully CMOS-compatible
- Certification: ISO 9001:2015 certified
- MES: Manufacturing Execution System (MES) for planning, traceability, and documentation
- Lithography: i-line (400 nm L&S) and DUV cluster (130 nm L&S)
- Virtual tour: https://www.mems-technologies.com/
