Advanced analytical expertise for ensuring the quality of wafer surfaces. / 2026
Fraunhofer IPMS expands its service portfolio to include ultratrace elemental analysis on wafers
The Fraunhofer Institute for Photonic Microsystems IPMS is expanding its analytical capabilities in the field of wafer contamination. In a dedicated laboratory, the established method of vapor phase decomposition is used in combination with inductively coupled plasma mass spectrometry (VPD-ICP-MS). This combination enables precise monitoring of wafer surface contamination.
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