300 mm CMOS Cleanroom

With the Center Nanoelectronic Technologies (CNT), Fraunhofer IPMS conducts applied research on 300 mm wafers for microchip producers, suppliers, equipment manufacturers and R&D partners.

For processing customer orders, 2700 m² of clean room space of class 6 and 3 (according to ISO 14644-1) as well as laboratory space for more than 80 processing and analytical tools are available. The equipment park includes deposition and etching systems as well as inspection and analysis equipment for determining defects and measuring layer properties.