300 mm CMOS Cleanroom

Process and product development for nanoelectronics

With the Center Nanoelectronic Technologies (CNT), Fraunhofer IPMS conducts applied research on 300 mm wafers for microchip producers, suppliers, equipment manufacturers and R&D partners. In the area of FEoL and BEoL we offer the following technology developments and services on Ultra Large Scale Integration level (ULSI):

Please select:

Atomic Layer Deposition (ALD)

Nanopatterning / E-Beam Lithography

Chemical Mechanical Polishing (CMP)

Wafer Metallization

Wafer Cleaning

Wafer Services

Analytical Services & Metrology

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Fraunhofer IPMS - Cleanroom Tour