Branch »Integrated Silicon Systems« (ISS)

Research for the Industry of Tomorrow

The Fraunhofer Institute for Photonic Microsystems IPMS is actively shaping the structural transformation of the Lusatia region. With its Integrated Silicon Systems (ISS) branch in Cottbus, the institute develops key technologies for the industry of tomorrow and combines excellent research with a consistent focus on transferring innovations into economic applications.

The research focuses on intelligent sensor systems, microelectronics, and AI-based systems. The institute develops technologies that enable machines and technical systems to precisely perceive their surroundings, process data locally in an energy-efficient manner, and derive autonomous decisions from this information. The applications range from industrial manufacturing and energy and environmental technologies to medical engineering.

Added Value for Companies and the Region

For small and medium-sized enterprises (SMEs), Fraunhofer IPMS provides access to state-of-the-art technologies and scientific expertise. Together with regional and national partners, the institute develops innovative solutions ranging from initial concepts to market-oriented demonstrators and supports companies in bringing new products and business models into practical application more quickly. This creates new value creation potential, highly qualified jobs, and long-term prospects for the economic development of the Lusatia region.

Strong Partnership with BTU Cottbus-Senftenberg

A key foundation for this development is the close collaboration with Brandenburg University of Technology Cottbus-Senftenberg (BTU Cottbus-Senftenberg). Institute Director Prof. Dr. Harald Schenk holds the professorship for Micro- and Nanosystems there. This long-standing cooperation led to the establishment of the Fraunhofer Project Group MESYS in 2012, from which the ISS branch of Fraunhofer IPMS in Cottbus emerged in 2018. A successful example of technology transfer is the spin-off Arioso Systems GmbH (acquired by Bosch Sensortec), which commercializes MEMS technology for miniaturized speaker systems developed in Cottbus (more information).

Bringing Innovations into Application Together

With the structural transformation projects iCampµs and OASYS, Fraunhofer IPMS is establishing long-term research and innovation structures in the Lusatia region. The goal is to transfer research results into market-ready products more quickly and provide companies in Lusatia with access to technological innovations.

Strengthening Cottbus as a High-Tech Location

Cottbus offers research infrastructures that bring together science, industry, and start-ups at a single location. Together with partners from academia and industry, Fraunhofer IPMS aims to develop the Lusatia region into an internationally recognized innovation hub for sensor technology, microelectronics, and artificial intelligence, thereby making a sustainable contribution to the region’s competitiveness.

At the Integrated Silicon Systems ISS in Cottbus we offer state-of-the-art research in the field of mechanical and electrical characterization including dynamic testing of micro devices, electrostatic actuators, especially for microfluid applications, and terahertz micromodules.

The institute section has several laboratories at the Brandenburg University of Technology Cottbus-Senftenberg (BTU C-S), which are equipped with state-of-the-art measurement equipment for the characterization of devices and subsystems. For this purpose, parts of the laboratory infrastructure will be relocated to a clean room environment. The measurement equipment is used to characterize optical, electrical and microfluidic properties of devices. For this purpose, a digital holographic microscope, an infrared microscope, a terahertz system as well as a wide range of electrical measuring equipment and soon a scanning electron microscope will be available. With a "two-photon lithography system" with up to 300nm voxel size, adjustments can be made in the form of rapid prototyping on microsensors and microactuators.

We are able to perform the following measurements and services both at wafer level and on the individual component: