Fraunhofer-Institut für Photonische MikrosystemeMEMS Toolpark
Website under contruction!
Process Area |
SPECIFIC APPLICATION |
SUPPLIER |
|---|---|---|
| LITHOGRAPHY | ||
| i-Line | i-Line Lithography for 400 nm L / S | NSR-2205i 14E2 | Nikon |
| Spin and Spray Coating | SK-80EX | Screen | |
| Contact, Proximity | Double-side Mask Aligner | MA 200 GEN 3 | SUSS |
| High Topology Spray Coater | EV101 | EVG | |
NSR-S210D Hi NA-248nm Exposure Scanning System | Nikon
DUV litho Track | TEL ACT8
MT3000IR OVL-control | MueTec
Grinder | DISCO Corp.